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光阻去除設(shè)備 NA-8000品牌
萬德思諾產(chǎn)地
天津樣本
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產(chǎn)品圖片:
產(chǎn)品型號(hào):
NA-8000
產(chǎn)品特點(diǎn)介紹:
1. All in One system
- All units sucha as M/W plasma and power supply, Controll unit, and pumping units are included in system
2. Applicable for 4” – 6” SiC wafer
- Batch process using 330mm SiC tray
3. Good process optimization for both CC and PR
- M/W with high temperature stage and O2/N2 gas used
4. Possible to use other applications
- Organic film etching, Residue removal, Polyimide etching, etc
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